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Semiconductor and Electronics

Close-up of semiconductor wafer under precision testing equipment, representing high-purity sealing solutions for various environment and wafer fabrication processes.

At Katon®, we understand that the electronics, electrical, and semiconductor industries require the highest standards of reliability and precision. Our sealing solutions are engineered to withstand extreme conditions and provide dependable performance, ensuring your equipment operates smoothly. Whether it's for electrical applications,  semiconductor manufacturing equipment or post manufacturing pipelines, we’ve designed our products to meet the demanding needs of these critical industries.


Dry Process Etch

Dry etching processes in semiconductor manufacturing expose sealing materials to aggressive plasma gases, high vacuum, and elevated temperatures. These environments demand seals with exceptional plasma resistance, low outgassing, and minimal particle generation. Katon® advanced perfluoroelastomer (FFKM) O-rings and seals are specially formulated to maintain sealing integrity in these critical dry process chambers.

Features and Benefits

• Outstanding resistance to aggressive plasma gases including O₂, CF₄, NF₃, and N₂H₂, etc.
• Low outgassing and minimal particle shedding to protect wafer integrity
• Thermal stability under high-temperature dry etch conditions
• Advanced FFKM compounds engineered for long-term plasma exposure
• Minimized risk of metal ion contamination and extractables

Available Size list

Katon® grades with Dry Process Etch

Katon® Compound Base Polymer Color Shore A (±5) Operating Temperature Curing System
Katon® 7175C FFKM OFF-WHITE 78 -10℃~230℃/14℉~446℉ Peroxide
Katon® 9175C FFKM DARK AMBER 72 -10℃~317℃/14℉~602℉ Triazine
Katon® 7175W FFKM WHITE 75 -10℃~230℃/14℉~446℉ Peroxide
Katon® 7275W FFKM WHITE 75 -10℃~260℃/14℉~500℉ Peroxide
Katon® 7180W FFKM WHITE 80 -10℃~230℃/14℉~446℉ Peroxide
Katon® 8075W FFKM WHITE 75 -10℃~290℃/14℉~554℉ Peroxide
Katon® 8175C FFKM UMBER 77 -10℃~290℃/14℉~554℉ Peroxide
Katon® 9075W FFKM BEIGE 75 -10℃~317℃ / 14℉~602℉ Triazine

Applicable Environments

Recommended

  • Semiconductor dry processes
  • Vacuum chambers
  • Plasma gases such as O₂, CF₄, N₂, NF₃, He, and N₂H₂
  • Semiconductor fabs requiring ultra-low metal ion generation from O-rings and seals
  • Etch environments demanding excellent chemical and thermal resistance from FFKM or FKM seals

Not Recommended

  • Use with fluorinated refrigerants or uranium hexafluoride.
  • Applications requiring resistance to specific halogenated fluids without specialized grades.

Our Services

Plasma Degradation Benchmarking
Due to the lack of a universal industry standard for characterizing elastomer resistance to plasma environments, OEMs and semiconductor fabs typically rely on in-site performance data and real-world testing. 

At Katon, we are committed to providing more than just high-quality O-Rings. We offer a complete customer experience from start to finish. Our services include:

  • Expert Consultation: Our team of engineers and product specialists work closely with you to understand your specific needs and provide tailored solutions.
  • Custom Solutions: We offer flexible options for custom sizes, materials, and configurations, ensuring a perfect fit for your unique applications.
  • Fast Turnaround: With our advanced manufacturing capabilities, we ensure quick production and delivery times to meet your project deadlines.
  • Technical Support: Our dedicated support team is always ready to assist with material selection, application advice, and troubleshooting.
  • Global Reach: Katon® serves industries worldwide, with a commitment to delivering reliable, cost-effective sealing solutions to customers across different sectors.

Whether you’re looking for standard O-Rings or specialized custom seals, Katon® is here to help you find the right solution, every time.